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Area Selective Deposition (ASD) 2019 will be held April 4th (Thursday) and 5th (Friday) at IMEC in Leuven, Belgium. For more information, please contact Andrea Illiberi, andrea.illiberi@asm.com.

Overview

The principal chemical processes and mechanisms that enable Area Selective Deposition (ASD) are rapidly becoming critical in several areas of materials and technological advancement. Most notably, the semiconductor industry will likely need new ASD processes to enable “chemical alignment” to complement traditional physical alignment (i.e. lithography) to allow transistors to scale to less than 10 nm dimensions. Other fields are also exploring chemical selectivity in materials to achieve precise targeted performance. Catalytic materials, for example, which are commonly employed to promote chemically selective reactions, are now being designed and constructed using site-selective deposition reactions. In addition, the growing complexity of energy generation and storage materials are also driving the need for new site- or area-selective processes to control heterogeneous material structures.

To share advances in these areas, the 3rd Area Selective Deposition Workshop (ASD 2018), will be held on April 29 – May 1, 2018, at North Carolina State University in Raleigh North Carolina USA. The Workshop will bring together leading international scientists and engineers from academia and industry from all regions to share results and insights into: 1) fundamental principles and barriers to area selective deposition; 2) technological needs and challenges of ASD; 3) new chemical approaches and processes to address the expanding needs; and 4) surface characterization techniques and metrology innovation for ASD.

Based on successful workshops at the Eindhoven University of Technology in 2017 and at  IMEC in Leuven Belgium in 2016, ASD 2018 will consist of two days of presentations and discussions, preceded by a welcome reception at North Carolina State University on April 29. The program will include a series of invited and contributed speakers, a panel discussion, as well as a poster session reception on the evening of April 30.

Panel Discussion on Metrology for ASD
As area selective deposition becomes critical for multiple uses, loss of selectivity and defect formation continue to be obstacles to practical implementation. New surface characterization and metrologies are needed for better mechanistic understanding of defect formation and mitigation. This panel will bring experts from academia, industry and consortia to discuss these challenges and potential solution paths.

ABSTRACT SUBMISSION DETAILS

Program Chair

Gregory Parsons
North Carolina State University, USA

Organizing Committee

Annelies Delabie
IMEC, Belgium (ASD 2016 Chair)

Dennis Hausmann
Lam Research, USA

Adrie Mackus
Eindhoven University of Technology,
The Netherlands (ASD 2017 Chair)

Gregory Parsons
North Carolina State University, USA
(ASD 2018 Chair)

PROGRAM COMMITTEE

Key Dates

Abstract Submission Deadline:
March 5, 2018
Author Acceptance Notifications:
March 26, 2018
Early Registration Deadline:
April 6, 2018
Hotel Reservation Deadline:
April 6, 2018

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Key Dates

Abstract Submission Deadline:
March 5, 2018

Author Acceptance Notifications:
March 26, 2018

Early Registration Deadline:
April 6, 2018

Hotel Reservation Deadline:
April 6, 2018

Downloads

  • Sponsor Form
  • Presentation & Poster Guidelines

AVS
Della Miller

Event Manager
110 Yellowstone Dr. Suite 120
Chico, CA 95973
(530) 896-0477
della@avs.org

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